MEASUREMENT OF CONTACT RESISTANCE OF AN OHMIC CONTACT APPLIED TO A HIGH-RESISTIVITY PHOTOCONDUCTOR

被引：7

作者：

MATHUR, VK ^{[1
]}

CHANG, CS ^{[1
]}

LEE, CH ^{[1
]}

机构：

[1] UNIV MARYLAND,DEPT ELECT ENGN,COLLEGE PK,MD 20742

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1981年 / 52卷 / 04期

关键词：

D O I：

10.1063/1.1136651

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：616 / 618

页数：3

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