INVESTIGATION OF ERBIUM DOPING OF INP AND (GA,IN)(AS,P) LAYERS GROWN BY LPE

被引:15
作者
CHATTERJEE, AK
HAIGH, J
机构
[1] British Telecom Research Laboratories, Martlesham Heath
关键词
D O I
10.1016/0022-0248(90)90027-I
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The growth of erbium-doped InP and (Ga,In)(As,P) lattice-matched to InP has been carried out using LPE, incorporating several refinements designed to reduce the deleterious formation of the oxide and hydride of erbium which have been a feature of previous reports. The work did not reproducibly result in material capable of Er-related luminescence near 1.54-mu-m. It is concluded that erbium-rich particulate inclusions in the layers are the major source of the 1.54-mu-m emission previously reported from such LPE layers.
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页码:537 / 542
页数:6
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