ION-BEAM MIXING OF IRON-OXIDE MARKER LAYERS IN DOPED AND UNDOPED ALUMINA THIN-FILMS

被引：4

作者：

COOPER, EA

NASTASI, M

机构：

[1] Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1994年 / 77卷 / 01期

关键词：

D O I：

10.1111/j.1151-2916.1994.tb06988.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin films of iron-doped and pure amorphous alumina with embedded marker layers of iron oxide (Fe2O3) were ion-beam mixed with 210-keV argon in a temperature range of - 164-degrees to 750-degrees-C. The marker exhibited a strong temperature-dependent spreading (T > 450-degrees-C) into the undoped alumina matrix, but the marker spreading into the iron-doped matrix was inhibited by the presence of the dopant.

引用

页码：268 / 270

页数：3

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