A MODEL FOR THE SCANNING TUNNELING MICROSCOPE OPERATING IN AN ELECTROLYTE SOLUTION

被引:63
作者
SCHMICKLER, W
HENDERSON, D
机构
[1] UNIV BONN,INST PHYS CHEM,W-5300 BONN,GERMANY
[2] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120
来源
JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1990年 / 290卷 / 1-2期
关键词
D O I
10.1016/0022-0728(90)87439-Q
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
[No abstract available]
引用
收藏
页码:283 / 291
页数:9
相关论文
共 14 条
[1]   INSITU SCANNING TUNNELING MICROSCOPY AT POTENTIAL CONTROLLED AG(100) SUBSTRATES [J].
CHRISTOPH, R ;
SIEGENTHALER, H ;
ROHRER, H ;
WIESE, H .
ELECTROCHIMICA ACTA, 1989, 34 (08) :1011-1022
[2]   IONIZATION-POTENTIALS AND ELECTRON AFFINITIES OF METAL CLUSTERS [J].
CINI, M .
JOURNAL OF CATALYSIS, 1975, 37 (01) :187-190
[3]  
CRASTON DH, 1988, J ELECTROCHEM SOC, V135, P783
[4]   DIELECTRIC THEORY OF BARRIER HEIGHT AT METAL-SEMICONDUCTOR AND METAL-INSULATOR INTERFACES [J].
HIRABAYA.K .
PHYSICAL REVIEW B, 1971, 3 (12) :4023-&
[5]   INSITU SCANNING TUNNELING MICROSCOPY OF PLATINUM-ELECTRODE IN SULFURIC-ACID [J].
ITAYA, K ;
HIGAKI, K ;
SUGAWARA, S .
CHEMISTRY LETTERS, 1988, (03) :421-424
[6]   THE APPLICATION OF SCANNING TUNNELING MICROSCOPY TO INSITU STUDIES OF NICKEL ELECTRODES UNDER POTENTIAL CONTROL [J].
LEV, O ;
FAN, FR ;
BARD, AJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) :783-784
[7]   SCANNING TUNNELING MICROSCOPY AT POTENTIAL CONTROLLED ELECTRODE SURFACES IN ELECTROLYTIC ENVIRONMENT [J].
LUSTENBERGER, P ;
ROHRER, H ;
CHRISTOPH, R ;
SIEGENTHALER, H .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1988, 243 (01) :225-235
[8]   STM IMAGING OF NOBLE-METAL ELECTRODES IN SOLUTION UNDER POTENTIOSTATIC CONTROL [J].
OTSUKA, I ;
IWASAKI, T .
JOURNAL OF MICROSCOPY-OXFORD, 1988, 152 :289-297
[9]  
PLESKOV YV, 1978, ADV ELECTROCHEMISTRY, V11
[10]   APPROXIMATE SOLUTION FOR THE ELECTRONIC DENSITY PROFILE AT THE SURFACE OF JELLIUM [J].
SCHMICKLER, W ;
HENDERSON, D .
PHYSICAL REVIEW B, 1984, 30 (06) :3081-3083