The device parameters of short-gate GaAs and InP FETs have been found to be dependent on the non-equilibrium velocity overshoot pnenomena. Both v//s//a//t and E//s are found to be larger for shorter gates. The v-E characteristics of Pucel et al. are modified. f//T and other parameters of GaAs, InP and Si are given as a function of gate length and bias. The F//T of InP MESFETs with doping densitity of 10**1**7 cm** minus **3 is only 20% higher than those of equivalent GaAs MESFETs at 300 K. Comparison with other work is also presented.