VELOCITY OVERSHOOT EFFECT ON A SHORT-GATE MICROWAVE MESFET

被引:24
作者
WANG, YC
HSIEH, YT
机构
基金
美国国家航空航天局;
关键词
D O I
10.1080/00207217908938617
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The device parameters of short-gate GaAs and InP FETs have been found to be dependent on the non-equilibrium velocity overshoot pnenomena. Both v//s//a//t and E//s are found to be larger for shorter gates. The v-E characteristics of Pucel et al. are modified. f//T and other parameters of GaAs, InP and Si are given as a function of gate length and bias. The F//T of InP MESFETs with doping densitity of 10**1**7 cm** minus **3 is only 20% higher than those of equivalent GaAs MESFETs at 300 K. Comparison with other work is also presented.
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页码:49 / 66
页数:18
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