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DEPOSITED SILICA WAVE-GUIDE FOR INTEGRATED OPTICAL CIRCUITS
被引:20
作者
:
IZAWA, T
论文数:
0
引用数:
0
h-index:
0
IZAWA, T
MORI, H
论文数:
0
引用数:
0
h-index:
0
MORI, H
MURAKAMI, Y
论文数:
0
引用数:
0
h-index:
0
MURAKAMI, Y
SHIMIZU, N
论文数:
0
引用数:
0
h-index:
0
SHIMIZU, N
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1981年
/ 38卷
/ 07期
关键词
:
D O I
:
10.1063/1.92426
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:483 / 485
页数:3
相关论文
共 4 条
[1]
CALORIMETRIC MEASUREMENT OF LINBO3 WAVEGUIDE ABSORPTION LOSSES
[J].
ALLEN, SD
论文数:
0
引用数:
0
h-index:
0
机构:
Center for Laser Studies, University of Southern California, University Park
ALLEN, SD
;
GARMIRE, E
论文数:
0
引用数:
0
h-index:
0
机构:
Center for Laser Studies, University of Southern California, University Park
GARMIRE, E
;
BASS, M
论文数:
0
引用数:
0
h-index:
0
机构:
Center for Laser Studies, University of Southern California, University Park
BASS, M
;
PACKER, B
论文数:
0
引用数:
0
h-index:
0
机构:
Center for Laser Studies, University of Southern California, University Park
PACKER, B
.
APPLIED PHYSICS LETTERS,
1979,
34
(07)
:435
-437
[2]
BAGLEY BG, 1979, MATERIAL PROPERTIES, P167
[3]
SELECTIVE ETCHING OF SI RELATIVE TO SIO2 WITHOUT UNDERCUTTING BY CBRF3 PLASMA
[J].
MATSUO, S
论文数:
0
引用数:
0
h-index:
0
MATSUO, S
.
APPLIED PHYSICS LETTERS,
1980,
36
(09)
:768
-770
[4]
ETCHING CHARACTERISTICS OF VARIOUS MATERIALS BY PLASMA REACTIVE SPUTTER ETCHING
[J].
MATSUO, S
论文数:
0
引用数:
0
h-index:
0
机构:
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
MATSUO, S
.
JAPANESE JOURNAL OF APPLIED PHYSICS,
1978,
17
(01)
:235
-236
←
1
→
共 4 条
[1]
CALORIMETRIC MEASUREMENT OF LINBO3 WAVEGUIDE ABSORPTION LOSSES
[J].
ALLEN, SD
论文数:
0
引用数:
0
h-index:
0
机构:
Center for Laser Studies, University of Southern California, University Park
ALLEN, SD
;
GARMIRE, E
论文数:
0
引用数:
0
h-index:
0
机构:
Center for Laser Studies, University of Southern California, University Park
GARMIRE, E
;
BASS, M
论文数:
0
引用数:
0
h-index:
0
机构:
Center for Laser Studies, University of Southern California, University Park
BASS, M
;
PACKER, B
论文数:
0
引用数:
0
h-index:
0
机构:
Center for Laser Studies, University of Southern California, University Park
PACKER, B
.
APPLIED PHYSICS LETTERS,
1979,
34
(07)
:435
-437
[2]
BAGLEY BG, 1979, MATERIAL PROPERTIES, P167
[3]
SELECTIVE ETCHING OF SI RELATIVE TO SIO2 WITHOUT UNDERCUTTING BY CBRF3 PLASMA
[J].
MATSUO, S
论文数:
0
引用数:
0
h-index:
0
MATSUO, S
.
APPLIED PHYSICS LETTERS,
1980,
36
(09)
:768
-770
[4]
ETCHING CHARACTERISTICS OF VARIOUS MATERIALS BY PLASMA REACTIVE SPUTTER ETCHING
[J].
MATSUO, S
论文数:
0
引用数:
0
h-index:
0
机构:
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
MATSUO, S
.
JAPANESE JOURNAL OF APPLIED PHYSICS,
1978,
17
(01)
:235
-236
←
1
→