THERMAL EVOLUTION OF X/C MULTILAYERS (WITH X = W, NI, OR SIWSI) - A SYSTEMATIC STUDY

被引:34
作者
DUPUIS, V
RAVET, MF
TETE, C
PIECUCH, M
LEPETRE, Y
RIVOIRA, R
ZIEGLER, E
机构
[1] UNIV AIX MARSEILLE 3,FAC SCI ST JEROME,INTERACT PHOTON MATIERE LAB,F-13013 MARSEILLE,FRANCE
[2] EUROPEAN SYNCHROTRON RADIAT FACIL,F-38043 GRENOBLE,FRANCE
关键词
D O I
10.1063/1.347055
中图分类号
O59 [应用物理学];
学科分类号
摘要
The thermal behavior of X/C multilayers (nanometer-thick layers made of tungsten, nickel, or SiWSi alternating with carbide or pure carbon) was studied. Two types of annealing were performed: the pulsed laser annealing in air and the classical thermal annealing in a vacuum furnace. Depending on the composition and the structure of the layered materials, thermal stability or diffusion mechanisms were observed and further analyzed by small-angle x-ray scattering, transmission electron microscopy, and Auger electron spectroscopy. The results show that the period expansion and the reflectivity evolution, that were observed in some cases after treatment, are caused both by structural changes into the layers and by exchange of matter between layers. These changes always induce a partial graphitization of the amorphous carbon and, in the case of W/C multilayers, the formation of a W2C compound.
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收藏
页码:5146 / 5154
页数:9
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