PROPERTIES OF AL2O3 FILMS PREPARED BY ARGON ION-ASSISTED DEPOSITION

被引：9

作者：

ALROBAEE, MS ^{[1
]}

KRISHNA, MG ^{[1
]}

SUBANNA, GN ^{[1
]}

RAO, KN ^{[1
]}

MOHAN, S ^{[1
]}

机构：

[1] INDIAN INST SCI,MAT RES CTR,BANGALORE 560012,KARNATAKA,INDIA

来源：

JOURNAL OF MATERIALS RESEARCH | 1994年 / 9卷 / 10期

关键词：

D O I：

10.1557/JMR.1994.2688

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Aluminum oxide films have been prepared by ion assisted deposition using argon ions with energy in the range 300 to 1000 eV and current density in the range 50 to 220 mu A/cm(2). The influence of ion energy and current density on the optical and structural properties has been investigated. The refractive index, packing density, and extinction coefficient are found to be very sensitive to the ion beam parameters and substrate temperatures. The as-deposited films were found to be amorphous and could be transformed into crystalline phase on annealing. However, the crystalline phases were different in films prepared at ambient and elevated substrate temperatures.

引用

页码：2688 / 2694

页数：7

共 26 条

[1] INFLUENCE OF SUBSTRATE-TEMPERATURE ON THE PROPERTIES OF ARGON-ION-ASSISTED-DEPOSITED CEO2 FILMS [J].

ALROBAEE, MS ;

SHIVALINGAPPA, L ;

RAO, KN ;

MOHAN, S .

THIN SOLID FILMS, 1992, 221 (1-2) :214-219

[2] INFLUENCE OF SUBSTRATE-TEMPERATURE ON THE PROPERTIES OF OXYGEN-ION-ASSISTED DEPOSITED CEO2 FILMS [J].

ALROBAEE, MS ;

RAO, KN ;

MOHAN, S .

JOURNAL OF APPLIED PHYSICS, 1992, 71 (05) :2380-2386

[3]

ALROBAEE MS, IN PRESS VACUUM

[4]

ALROBAEE MS, 1991, J VAC SCI TECHNOL A, V6, P3048

[5] ION-BEAM-ASSISTED DEPOSITION OF AL2O3 THIN-FILMS [J].

BHATTACHARYA, RS ;

RAI, AK ;

MCCORMICK, AW .

SURFACE & COATINGS TECHNOLOGY, 1991, 46 (02) :155-163

[6] LOW-LOSS WAVEGUIDING IN ION-ASSISTED-DEPOSITED THIN-FILMS [J].

BINH, LN ;

NETTERFIELD, RP ;

MARTIN, PJ .

APPLICATIONS OF SURFACE SCIENCE, 1985, 22-3 (MAY) :656-662

[7] MICROSTRUCTURAL EVOLUTION AND PROPERTIES OF NANOCRYSTALLINE ALUMINA MADE BY REACTIVE SPUTTERING DEPOSITION [J].

CHOU, TC ;

ADAMSON, D ;

MARDINLY, J ;

NIEH, TG .

THIN SOLID FILMS, 1991, 205 (02) :131-139

[8]

GIBSON UJ, 1987, PHYS THIN FILMS, V13, P109

[9] PROPERTIES OF AL2O3 THIN-FILMS PREPARED BY ION-ASSISTED EVAPORATION [J].

KUBLER, W .

THIN SOLID FILMS, 1991, 199 (02) :247-257

[10] MODIFICATION OF THE OPTICAL AND STRUCTURAL-PROPERTIES OF DIELECTRIC ZRO2 FILMS BY ION-ASSISTED DEPOSITION [J].

MARTIN, PJ ;

NETTERFIELD, RP ;

SAINTY, WG .

JOURNAL OF APPLIED PHYSICS, 1984, 55 (01) :235-241

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