PROPERTIES OF AL2O3 THIN-FILMS PREPARED BY ION-ASSISTED EVAPORATION

被引：8

作者：

KUBLER, W

机构：

[1] Institut für Technologie der Elektrotechnik, Universität Karlsruhe, 7500 Karlsruhe

来源：

THIN SOLID FILMS | 1991年 / 199卷 / 02期

关键词：

D O I：

10.1016/0040-6090(91)90007-K

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Al2O3 films were produced by bombardment with oxygen ions during evaporation in a conventional electron beam evaporation system. Contrary to films produced without ion bombardment but otherwise identical parameters, these Al2O3 films exhibited considerably improved dielectric properties. The improvements can be explained by a significantly increased homogeneity and a raised density of the Al2O3 films.

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收藏

页码：247 / 257

页数：11

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