THE PRESENCE OF ISOLATED HYDROGEN DONORS IN HEAVILY CARBON-DOPED GAAS

被引:22
作者
FUSHIMI, H
WADA, K
机构
[1] NTT LSI Laboratories, Atsugi-shi, Kanagawa, 243-01, 3-1, Morinosato-Wakamiya
关键词
D O I
10.1016/0022-0248(94)91086-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The deactivation mechanism of carbon accepters in GaAs has systematically been studied by measuring the annealing behavior and depth profiles of the carrier concentration. It is found that hydrogen impurities dominate carbon deactivation. Their deactivation undergoes two different ways: Hydrogen donors isolated from carbon accepters compensate carbon and hydrogen impurities neutralize the carbon by forming neutral carbon-hydrogen complexes. The compensating hydrogen donors diffuse out extremely fast at relatively low temperatures. This is, to the best of our knowledge, the first report on the presence of isolated hydrogen donors in heavily carbon-doped GaAs. The dissociation of carbon-hydrogen complexes is much slower than reported. The mechanism is discussed in terms of a hydrogen retrapping effect by carbon.
引用
收藏
页码:420 / 426
页数:7
相关论文
共 31 条
[1]   CARBON DOPING OF III-V-COMPOUNDS GROWN BY MOMBE [J].
ABERNATHY, CR ;
PEARTON, SJ ;
REN, F ;
HOBSON, WS ;
FULLOWAN, TR ;
KATZ, A ;
JORDAN, AS ;
KOVALCHICK, J .
JOURNAL OF CRYSTAL GROWTH, 1990, 105 (1-4) :375-382
[2]   ULTRAHIGH DOPING OF GAAS BY CARBON DURING METALORGANIC MOLECULAR-BEAM EPITAXY [J].
ABERNATHY, CR ;
PEARTON, SJ ;
CARUSO, R ;
REN, F ;
KOVALCHIK, J .
APPLIED PHYSICS LETTERS, 1989, 55 (17) :1750-1752
[3]   EVIDENCE FOR COMPLEXES OF HYDROGEN WITH DEEP-LEVEL DEFECTS IN BULK III-V MATERIALS [J].
CLERJAUD, B ;
COTE, D ;
NAUD, C .
PHYSICAL REVIEW LETTERS, 1987, 58 (17) :1755-1757
[4]   CARBON DIFFUSION IN UNDOPED, N-TYPE, AND P-TYPE GAAS [J].
CUNNINGHAM, BT ;
GUIDO, LJ ;
BAKER, JE ;
MAJOR, JS ;
HOLONYAK, N ;
STILLMAN, GE .
APPLIED PHYSICS LETTERS, 1989, 55 (07) :687-689
[5]   GROWTH AND DIFFUSION OF ABRUPT ZINC PROFILES IN GALLIUM-ARSENIDE AND HETEROJUNCTION BIPOLAR-TRANSISTOR STRUCTURES GROWN BY ORGANOMETALLIC VAPOR-PHASE EPITAXY [J].
ENQUIST, P ;
HUTCHBY, JA ;
DELYON, TJ .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (09) :4485-4493
[6]  
Frenkel J, 1938, PHYS REV, V54, P647, DOI 10.1103/PhysRev.54.647
[7]   VERY HIGH-CARBON INCORPORATION IN METALORGANIC VAPOR-PHASE EPITAXY OF HEAVILY DOPED P-TYPE GAAS [J].
HANNA, MC ;
LU, ZH ;
MAJERFELD, A .
APPLIED PHYSICS LETTERS, 1991, 58 (02) :164-166
[8]   COMPARISON OF GALLIUM AND ARSENIC PRECURSORS FOR GAAS CARBON DOPING BY ORGANOMETALLIC VAPOR-PHASE EPITAXY USING CCL4 [J].
HOBSON, WS ;
PEARTON, SJ ;
KOZUCH, DM ;
STAVOLA, M .
APPLIED PHYSICS LETTERS, 1992, 60 (26) :3259-3261
[9]  
HOBSON WS, 1992, MATER RES SOC SYMP P, V240, P45
[10]  
JOHNSON NM, 1994, MATER SCI FORUM, V143-, P867, DOI 10.4028/www.scientific.net/MSF.143-147.867