FORMATION OF VAPOUR-DEPOSITED SNO2 THIN-FILMS STUDIED BY RUTHERFORD BACKSCATTERING

被引：28

作者：

YAMAZAKI, T

MIZUTANI, U

IWAMA, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1982年 / 21卷 / 03期

关键词：

D O I：

10.1143/JJAP.21.440

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：440 / 445

页数：6

共 8 条

[1] CHEMICAL COMPOSITION AND ELECTRICAL PROPERTIES OF TIN OXIDE-FILMS PREPARED BY VAPOR-DEPOSITION [J].

ABOAF, JA ;

MARCOTTE, VC ;

CHOU, NJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (05) :701-702

[2]

AITCHISON RE, 1954, AUSTRALIAN J APPL SC, V5, P10

[3] OPTICAL AND ELECTRICAL PROPERTIES OF TIN OXIDE FILMS [J].

ISHIGURO, K ;

SASAKI, T ;

ARAI, T ;

IMAI, I .

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1958, 13 (03) :296-304

[4] FORMATION PROCESS OF MNBI THIN-FILMS [J].

IWAMA, Y ;

MIZUTANI, U ;

HUMPHREY, FB .

IEEE TRANSACTIONS ON MAGNETICS, 1972, MAG8 (03) :487-489

[5]

JARZEBSKI ZM, 1976, J ELECTROCHEM SOC, V123, pC199, DOI [10.1149/1.2133010, 10.1149/1.2132647, 10.1149/1.2133090]

[6]

KATSUBE Y, 1966, SHINKU, V9, P443

[7] ANALYSIS OF AMORPHOUS LAYERS ON SILICON BY BACKSCATTERING AND CHANNELING EFFECT MEASUREMENTS [J].

MEYER, O ;

GYULAI, J ;

MAYER, JW .

SURFACE SCIENCE, 1970, 22 (02) :263-&

[8]

Ziegler J. F, 1977, HELIUM STOPPING POWE

← 1 →