COULOMB INTERACTIONS IN PARTICLE BEAMS

被引：27

作者：

JANSEN, GH

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584148

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1977 / 1983

页数：7

共 10 条

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JANSEN, GH ;

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[3]

JANSEN GH, 1983, P MICROCIRCUIT ENG, P99

[4]

JANSEN GH, 1984, P MICROCIRCUIT ENG, P167

[5]

JANSEN GH, IN PRESS ADV ELECTRO

[6]

MOORE RD, 1983, SOLID STATE TECHNOL, V26, P127

[7] VARIABLE SPOT SHAPING FOR ELECTRON-BEAM LITHOGRAPHY [J].

PFEIFFER, HC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :887-890

[8]

STICKEL W, 1978, 8TH P INT C EL ION B, P32

[9]

VANLEEUWEN JMJ, 1983, OPTIK, V65, P179

[10] A HIGH-SPEED EBL COLUMN DESIGNED TO MINIMIZE BEAM INTERACTIONS [J].

VENEKLASEN, LH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :185-189