BEHAVIOR OF IMPLANTED XENON WHEN USED AS A MARKER DURING THE ANODIC-OXIDATION OF ALUMINUM - EVIDENCE FOR AN EXPLANATION OF A DOSE-DEPENDANT SPLITTING EFFECT

被引：9

作者：

THOMAS, JP ^{[1
]}

FALLAVIER, M ^{[1
]}

SPENDER, P ^{[1
]}

FRANCOIS, E ^{[1
]}

机构：

[1] SOC ANONYME TRAITEMENTS METAUX & ALLIAGES,F-38570 GONCELIN,FRANCE

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 03期

关键词：

D O I：

10.1149/1.2129716

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：585 / 590

页数：6

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