EXPERIMENTAL AND THEORETICAL PERFORMANCES OF AN ETCHED LAMELLAR MULTILAYER GRATING IN THE 1 KEV REGION

被引:12
作者
BERROUANE, H
ANDRE, JM
BARCHEWITZ, R
MORENO, T
SAMMAR, A
MALEK, CK
PARDO, B
RIVOIRA, R
机构
[1] CNRS,MICROSTRUCT & MICROELECTR LAB,F-92220 BAGNEUX,FRANCE
[2] UNIV AIX MARSEILLE 3,PHYS INTERACT PHOTONS MATIERE LAB,CNRS,URA 797,F-13396 MARSEILLE,FRANCE
[3] UNIV PARIS 11,UTILISAT RAYONNEMENT ELECTROMAGNET LAB,F-91405 ORSAY,FRANCE
[4] UNIV PARIS 11,INST OPT THEOR & APPL,CNRS,URA 14,F-91405 ORSAY,FRANCE
关键词
D O I
10.1016/0168-9002(92)90200-N
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The performance of a lamellar multilayer amplitude grating with a 0.24-mu-m pitch produced using holography and reactive ion etching is assessed in the 1 keV region with synchrotron radiation. The position and efficiency of the various orders of grating diffraction are compared to values calculated within the framework of kinematical or dynamical models. The unique properties of these optical devices are discussed.
引用
收藏
页码:521 / 530
页数:10
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