VARIATION IN SEU SENSITIVITY OF DOSE-IMPRINTED CMOS SRAMS

被引:33
作者
STASSINOPOULOS, EG
BRUCKER, GJ
VANGUNTEN, O
KIM, HS
机构
[1] GE,DIV ASTROSPACE,PRINCETON,NJ
[2] LAB PHYS SCI,COLLEGE PK,MD
[3] SCI SYST & APPLICAT INC,SEABROOK,MD
关键词
D O I
10.1109/23.45444
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:2330 / 2338
页数:9
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