CHARACTERISTICS OF MICROWAVE PLASMA AND PREPARATION OF A-SI THIN-FILM

[1] BOENIG HV, 1984, ADV LOW TEMPERATURE, V1

[2] BROWN SC, 1968, BASIC DATA PLASMA PH

[3] Chen F F, 1965, PLASMA DIAGNOSTIC TE

[4] PROPERTIES OF A HIGH-BETA PLASMA PRODUCED BY ELECTRON-CYCLOTRON HEATING [J]. NUCLEAR FUSION, 1964, 4 (04) : 344 - 353

[5] EFFECT OF A MAGNETIC FIELD UPON SATURATION ELECTRON CURRENT OF AN ELECTROSTATIC PROBE [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1964, 3 (12) : 789 - &

[6] GOLDSBOROUGH JP, 1970, APPL PHYS LETT, V41, P738

[7] STATIONARY POTENTIAL JUMPS IN A PLASMA [J]. PHYSICAL REVIEW LETTERS, 1980, 45 (26) : 2110 - 2113

[8] ION-BURST EXCITED BY A GRID IN A PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (02) : 738 - &

[9] MICROWAVE SPUTTERING SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1982, 53 (02) : 214 - 216

[10] MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (08): : L470 - L472

[1] BOENIG HV, 1984, ADV LOW TEMPERATURE, V1

[2] BROWN SC, 1968, BASIC DATA PLASMA PH

[3] Chen F F, 1965, PLASMA DIAGNOSTIC TE

[4] PROPERTIES OF A HIGH-BETA PLASMA PRODUCED BY ELECTRON-CYCLOTRON HEATING [J]. NUCLEAR FUSION, 1964, 4 (04) : 344 - 353

[5] EFFECT OF A MAGNETIC FIELD UPON SATURATION ELECTRON CURRENT OF AN ELECTROSTATIC PROBE [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1964, 3 (12) : 789 - &

[6] GOLDSBOROUGH JP, 1970, APPL PHYS LETT, V41, P738

[7] STATIONARY POTENTIAL JUMPS IN A PLASMA [J]. PHYSICAL REVIEW LETTERS, 1980, 45 (26) : 2110 - 2113

[8] ION-BURST EXCITED BY A GRID IN A PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (02) : 738 - &

[9] MICROWAVE SPUTTERING SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1982, 53 (02) : 214 - 216

[10] MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (08): : L470 - L472