BACK SURFACE GETTERING AND CR OUT-DIFFUSION IN VPE GAAS-LAYERS

被引:27
作者
MAGEE, TJ
PENG, J
HONG, JD
EVANS, CA
DELINE, VR
MALBON, RM
机构
[1] CHARLES EVANS & ASSOC,SAN MATEO,CA 94402
[2] AVANTEK INC,SANTA CLARA,CA 95051
关键词
D O I
10.1063/1.91070
中图分类号
O59 [应用物理学];
学科分类号
摘要
Mechanical back surface damage gettering has been investigated for improving the quality of GaAs substrates and VPE layers on semi-insulating GaAs. It has been shown that the pregettering of substrates reduces the interfacial defect density and alters the level of Cr out-diffusion into the VPE layer during growth. At a postdeposition anneal temperature of 800°C, Cr out-diffusion into the VPE layer is relatively suppressed in the pregettered substrate, while the ungettered sample shows larger concentrations of Cr within the epitaxial layer.
引用
收藏
页码:277 / 279
页数:3
相关论文
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