ENERGY-DENSITY AND REPETITION-RATE DEPENDENCES OF THE KRF-EXCIMER-LASER-INDUCED 1.9-EV EMISSION BAND IN TYPE-III FUSED SILICAS

被引:15
作者
KUZUU, N [1 ]
KOMATSU, Y [1 ]
MURAHARA, M [1 ]
机构
[1] TOKAI UNIV,FAC ENGN,DEPT ELECT ENGN,HIRATSUKA,KANAGAWA 25912,JAPAN
来源
PHYSICAL REVIEW B | 1993年 / 47卷 / 06期
关键词
D O I
10.1103/PhysRevB.47.3078
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The energy-density and repetition-rate dependences of the intensity of KrF-excimer-laser (5.0 eV)-induced 1.9-eV emission band in type-III fused silicas synthesized under different conditions were investigated. The intensity of the 1.9-eV band is proportional to the 1.7-th power of the energy density and the 0.6-th power of the repetition rate of the laser pulse. The origin of these dependencies was discussed based on the trapped-oxygen-molecule model proposed by Awazu and Kawazoe; by irradiating with the excimer laser, ozone molecules are formed from dissolved oxygen molecules and 1.9-eV photons are emitted in the course of the photodecomposition of the ozone molecules. Therefore, a two-step photon-absorption process is needed to emit the 1.9-eV photon. To form the ozone molecule, diffusion of the oxygen atoms produced by the photodecomposition of the trapped oxygen molecules are needed. This model suggests that the intensity of the 1.9-eV band is proportional to the square of the energy density and the square root of the repetition rate; this dependency is nearly the same as that of our experimental result.
引用
收藏
页码:3078 / 3082
页数:5
相关论文
共 17 条
[1]   2-PHOTON PROCESSES IN DEFECT FORMATION BY EXCIMER LASERS IN SYNTHETIC SILICA GLASS [J].
ARAI, K ;
IMAI, H ;
HOSONO, H ;
ABE, Y ;
IMAGAWA, H .
APPLIED PHYSICS LETTERS, 1988, 53 (20) :1891-1893
[2]   O-2 MOLECULES DISSOLVED IN SYNTHETIC SILICA GLASSES AND THEIR PHOTOCHEMICAL-REACTIONS INDUCED BY ARF EXCIMER LASER-RADIATION [J].
AWAZU, K ;
KAWAZOE, H .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (07) :3584-3591
[3]  
BRUCKNER R, 1970, J NONCRYST SOLIDS, V5, P1223
[4]  
DEVINE RAB, 1986, MATERIALS RES SOC P, V61, P213
[5]  
GRISCOM DL, 1991, NIPPON SERAM KYO GAK, V99, P923, DOI 10.2109/jcersj.99.923
[6]  
HAYASHI A, 1989, NEW CERAMICS, V2, P9
[7]  
Hetherington G, 1962, PHYS CHEM GLASSES-B, V3, P129
[8]  
KUZUU N, 1990, MATER RES SOC SYMP P, V172, P119
[9]   ARF-EXCIMER-LASER-INDUCED EMISSION AND ABSORPTION-BANDS IN FUSED-SILICA SYNTHESIZED IN REDUCING CONDITIONS [J].
KUZUU, N ;
KOMATSU, Y ;
MURAHARA, M .
PHYSICAL REVIEW B, 1991, 44 (17) :9265-9270
[10]   ARF-EXCIMER-LASER-INDUCED EMISSION AND ABSORPTION-BANDS IN FUSED-SILICA SYNTHESIZED UNDER OXIDIZING CONDITIONS [J].
KUZUU, N ;
KOMATSU, Y ;
MURAHARA, M .
PHYSICAL REVIEW B, 1992, 45 (05) :2050-2054