SUBMICRON NIOBIUM JUNCTIONS FOR SUBMILLIMETER-WAVE MIXERS USING OPTICAL LITHOGRAPHY

被引：16

作者：

DIERICHS, MMTM

PANHUYZEN, RA

HONINGH, CE

DEBOER, MJ

KLAPWIJK, TM

机构：

[1] UNIV GOTTINGEN,CTR MAT SCI,W-3400 GOTTINGEN,GERMANY

[2] SPACE RES ORG NETHERLANDS,9747 AD GRONINGEN,NETHERLANDS

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 07期

关键词：

D O I：

10.1063/1.108575

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

High-current density, submicron-sized superconductor-insulator-superconductor niobium junctions are made with optical lithography. With a novel process junctions as small as 0.8 mum 2 are routinely made using a controlled under-etch with the quality parameter V(m) up to 67 mV. The junction quality is found to be independent of the amount of under-etch. Used in a 345 and 490 GHz waveguide mixer, noise temperatures have been obtained as low as 131 K double-side band (DSB) and 120 K (DSB), respectively.

引用

页码：774 / 776

页数：3

共 10 条

[1]

DELANGE G, IN PRESS 1992 P APPL

[2] HIGH-QUALITY REFRACTORY JOSEPHSON TUNNEL-JUNCTIONS UTILIZING THIN ALUMINUM LAYERS [J].