IMPURITY REDISTRIBUTION IN BI-IMPLANTED SI AFTER NANOSECOND AND PICOSECOND ND LASER-PULSE IRRADIATION

被引:4
作者
CAMPISANO, SU
BAERI, P
RIMINI, E
MALVEZZI, AM
RUSSO, G
机构
[1] CISE SPA,I-120100 MILANO,ITALY
[2] POLITECN MILANO,I-20100 MILANO,ITALY
关键词
D O I
10.1063/1.93570
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:456 / 458
页数:3
相关论文
共 13 条
[1]   MELTING MODEL FOR PULSING-LASER ANNEALING OF IMPLANTED SEMICONDUCTORS [J].
BAERI, P ;
CAMPISANO, SU ;
FOTI, G ;
RIMINI, E .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :788-797
[2]   ORIENTATION AND VELOCITY DEPENDENCE OF SOLUTE TRAPPING IN SI [J].
BAERI, P ;
FOTI, G ;
POATE, JM ;
CAMPISANO, SU ;
CULLIS, AG .
APPLIED PHYSICS LETTERS, 1981, 38 (10) :800-802
[3]   DEPENDENCE OF TRAPPING AND SEGREGATION OF INDIUM IN SILICON ON THE VELOCITY OF THE LIQUID-SOLID INTERFACE [J].
BAERI, P ;
POATE, JM ;
CAMPISANO, SU ;
FOTI, G ;
RIMINI, E ;
CULLIS, AG .
APPLIED PHYSICS LETTERS, 1980, 37 (10) :912-914
[4]  
Baeri P., 1982, LASER ANNEALING SEMI
[5]   SEGREGATION AND INCREASED DOPANT SOLUBILITY IN PT-IMPLANTED AND LASER-ANNEALED SI LAYERS [J].
CULLIS, AG ;
WEBBER, HC ;
POATE, JM ;
SIMONS, AL .
APPLIED PHYSICS LETTERS, 1980, 36 (04) :320-322
[6]   MEASUREMENT OF THE VELOCITY OF THE CRYSTAL-LIQUID INTERFACE IN PULSED LASER ANNEALING OF SI [J].
GALVIN, GJ ;
THOMPSON, MO ;
MAYER, JW ;
HAMMOND, RB ;
PAULTER, N ;
PEERCY, PS .
PHYSICAL REVIEW LETTERS, 1982, 48 (01) :33-36
[7]   CALCULATION OF CARRIER AND LATTICE TEMPERATURES INDUCED IN SI BY PICOSECOND LASER-PULSES [J].
LIETOILA, A ;
GIBBONS, JF .
APPLIED PHYSICS LETTERS, 1982, 40 (07) :624-626
[8]   PHASE-TRANSFORMATION ON AND CHARGED-PARTICLE EMISSION FROM A SILICON CRYSTAL-SURFACE, INDUCED BY PICOSECOND LASER-PULSES [J].
LIU, JM ;
YEN, R ;
KURZ, H ;
BLOEMBERGEN, N .
APPLIED PHYSICS LETTERS, 1981, 39 (09) :755-757
[9]  
POATE JM, 1982, NATO C P SERIES
[10]  
POATE JM, 1982, LASER ELECTRON BEAM