SPATIAL DISTRIBUTION OF ELECTRON DENSITY AND ELECTRIC FIELD STRENGTH IN A HIGH-FREQUENCY DISCHARGE . CRITERIA FOR SIMILARITY

被引：21

作者：

BELL, AT

机构：

来源：

INDUSTRIAL & ENGINEERING CHEMISTRY FUNDAMENTALS | 1970年 / 9卷 / 01期

关键词：

D O I：

10.1021/i160033a026

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

收藏

页码：160 / &

相关论文

共 14 条

[1] ELECTRON DENSITY DISTRIBUTION IN A HIGH FREQUENCY DISCHARGE IN THE PRESENCE OF PLASMA RESONANCE
ALLIS, WP
BROWN, SC
EVERHART, E
[J]. PHYSICAL REVIEW, 1951, 84 (03): : 519 - 522
[2] HALL EFFECT AND ELECTRON DRIFT VELOCITIES IN THE PLASMA OF THE POSITIVE COLUMN
ANDERSON, JM
[J]. PHYSICS OF FLUIDS, 1964, 7 (09) : 1517 - 1526
[3] Brown S. C., 1959, BASIC DATA PLASMA PH
[4] EXPERIMENTAL DETERMINATIONS OF 1ST TOWNSEND IONIZATION COEFFICIENT IN HELIUM
CHANIN, LM
RORK, GD
[J]. PHYSICAL REVIEW, 1964, 133 (4A): : 1005 - +
[5] A NEW TECHNIQUE FOR PREPARING LOW SURFACE ENERGY POLYMERS FOR ADHESIVE BONDING
HANSEN, RH
SCHONHOR.H
[J]. JOURNAL OF POLYMER SCIENCE PART B-POLYMER LETTERS, 1966, 4 (3PB): : 203 - &
[6] Irvin S.M., 1968, P KODAK PHOTORESIST, V2, P26
[7] PREPARATION AND PROPERTIES OF SILICON NITRIDE PRODUCED BY A RADIO FREQUENCY GLOW DISCHARGE REACTION OF SILANE AND NITROGEN - PREPARATION AND PROPERTIES OF SILICON NITRIDE
KUWANO, Y
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1968, 7 (01) : 88 - &
[8] SILICON OXIDATION IN AN OXYGEN PLASMA EXCITED BY MICROWAVES
LIGENZA, JR
[J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (09) : 2703 - +
[9] Lompe A, 1932, ANN PHYS-BERLIN, V15, P300
[10] ACTIVATION OF PLASTIC SURFACES IN PLASMAJET
MANTELL, RM
ORMAND, WL
[J]. INDUSTRIAL & ENGINEERING CHEMISTRY PRODUCT RESEARCH AND DEVELOPMENT, 1964, 3 (04): : 300 - &