ION-BEAM TECHNIQUES FOR THIN AND THICK-FILM DEPOSITION

Film deposition techniques in which a considerable fraction of ionised species are involved, have found growing interest for applications on laboratory and industrial scale. Investigations using ion beams or mixed fluxes of ions and neutrals can contribute to a better understanding of plasma deposition, and they offer new possibilities for the preparation of special layer structures. This is outlined in connection with recent work on ion beam sputtering, ion beam condensation and ion beam plating. © 1979.