X-RAY PHOTOELECTRON-SPECTROSCOPY AND ATOMIC-FORCE MICROSCOPY CHARACTERIZATION OF THE EFFECTS OF ETCHING ZNXCD1-XTE SURFACES

X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) was used for the first time to characterize the chemical composition of modified surfaces of ZnxCd1-xTe single crystals. These surface treatments were selected for their relevance to device preparation procedures. The XPS peaks indicated an increase of the tellurium and a depletion of the cadmium concentrations upon etching in bromine methanol solution. AFM revealed the formation of pronounced Te inclusions. Higher x values correlated with a decrease in residual bromine left on the surface, while cut and polished samples had higher oxide concentrations and increased bromination of the surface than cleaved samples.