FERMI LEVEL EFFECT ON COMPOSITIONAL DISORDERING OF ALAS/GAAS SUPERLATTICE

被引:7
作者
OGAWA, K
KAWABE, M
机构
[1] Institute of Materials Science, University of Tsukuba
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 07期
关键词
AlAs/GaAs superlattice; Compositional disordering; Fermi level; Molecular beam epitaxy; Surface depletion layer;
D O I
10.1143/JJAP.29.1240
中图分类号
O59 [应用物理学];
学科分类号
摘要
The Fermi level effect on impurity-induced compositional disordering of the AlAs/GaAs superlattice has been investigated by studying the disordering at the surface. It is shown that the Si-induced disordering is suppressed at the surface and the thickness of the suppressed layer depends on the Si concentration; that is, the superlattice with the larger Si concentration has the thinner suppressed layer. These results indicate that the surface suppression effect originates from the surface depletion layer where the Fermi level is pinned near the midgap, and that the intermixing is explained by the Fermi level effect. © 1990 The Japan Society of Applied Physics.
引用
收藏
页码:1240 / 1242
页数:3
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