LOW-TEMPERATURE DEPOSITION OF ORIENTED C-AXIS AIN FILMS ON GLASS SUBSTRATES BY REACTIVE MAGNETRON SPUTTERING

被引：21

作者：

TAKEDA, F ^{[1
]}

HATA, T ^{[1
]}

机构：

[1] KANAZAWA UNIV,FAC TECHNOL,DEPT ELECT ENGN,KANAZAWA,ISHIKAWA 920,JAPAN

来源：

关键词：

D O I：

10.1143/JJAP.19.1001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1001 / 1002

页数：2

共 11 条

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