LOW-TEMPERATURE DEPOSITION OF ORIENTED C-AXIS AIN FILMS ON GLASS SUBSTRATES BY REACTIVE MAGNETRON SPUTTERING

被引:21
作者
TAKEDA, F [1 ]
HATA, T [1 ]
机构
[1] KANAZAWA UNIV,FAC TECHNOL,DEPT ELECT ENGN,KANAZAWA,ISHIKAWA 920,JAPAN
关键词
D O I
10.1143/JJAP.19.1001
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1001 / 1002
页数:2
相关论文
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