NONDESTRUCTIVE DETERMINATION OF COMPOSITION AND THICKNESS OF THIN FILMS OF PYROLYTICALLY DEPOSITED BOROSILICATE GLASS BY INFRARED ABSORPTION

被引：39

作者：

TENNEY, AS

机构：

来源：

关键词：

D O I：

10.1149/1.2407805

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1658 / &

共 11 条

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[2] IMAOKA M, 1965, J CERAM SOC JAPAN, V73, P264
[3] CHEMICAL VAPOR DEPOSITION OF SILICATE GLASSES FOR USE WITH SILICON DEVICES .2. FILM PROPERTIES
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HEIM, RC
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) : 568 - &
[4] CHEMICAL VAPOR DEPOSITION OF SILICATE GLASSES FOR USE WITH SILICON DEVICES .1. DEPOSITION TECHNIQUES
KERN, W
HEIM, R
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) : 562 - &
[5] KERN W, 1969, J ELECTROCHEM SOC, V116, pC251
[6] MACDEO PB, 1966, J CHEM PHYS, V44, P3357
[7] TAFT EJ, TO BE PUBLISHED
[8] TENNEY AS, TO BE PUBLISHED
[9] UTSUMI J, 1967, NIPPON KAGAKU ZASSHI, V88, P545
[10] WEAST RC, 1969, HDB CHEMISTRY PHYSIC, pB153