AFTERGLOW AND DECAYING PLASMA CVD SYSTEMS

[41] PLASMA-ASSISTED DEPOSITION PROCESSES - THEORY, MECHANISMS AND APPLICATIONS [J]. THIN SOLID FILMS, 1983, 107 (01) : 3 - 19

[42] SILICON-NITRIDE AND SILICON DIIMIDE GROWN BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 480 - 485

[43] PLASMA-INDUCED AND PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION [J]. THIN SOLID FILMS, 1985, 130 (1-2) : 135 - 154

[44] COMPARISON OF MICROWAVE AND LOWER FREQUENCY PLASMAS FOR THIN-FILM DEPOSITION AND ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1985, 3 (06): : 2643 - 2649

[45] ZDUNEK K, 1987, P INT C ION PLASMA A, P118

[46] ZDUNEK K, 1985, P INT C ION PLASMA A, P183

[41] PLASMA-ASSISTED DEPOSITION PROCESSES - THEORY, MECHANISMS AND APPLICATIONS [J]. THIN SOLID FILMS, 1983, 107 (01) : 3 - 19

[42] SILICON-NITRIDE AND SILICON DIIMIDE GROWN BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 480 - 485

[43] PLASMA-INDUCED AND PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION [J]. THIN SOLID FILMS, 1985, 130 (1-2) : 135 - 154

[44] COMPARISON OF MICROWAVE AND LOWER FREQUENCY PLASMAS FOR THIN-FILM DEPOSITION AND ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1985, 3 (06): : 2643 - 2649

[45] ZDUNEK K, 1987, P INT C ION PLASMA A, P118

[46] ZDUNEK K, 1985, P INT C ION PLASMA A, P183