HIGH-TEMPERATURE STABILITY OF SI/SIO2 INTERFACES AND THE INFLUENCE OF SIO FLUX ON THERMOMIGRATION OF IMPURITIES IN SIO2

被引：15

作者：

CELLER, GK

TRIMBLE, LE

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 25期

关键词：

D O I：

10.1063/1.100527

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2492 / 2494

页数：3

共 14 条

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