EFFECT OF ARGON SPUTTERING PRESSURE ON THE MAGNETIC-PROPERTIES AND MORPHOLOGY OF TBFECO FILMS

被引:18
作者
HATWAR, TK
PALUMBO, AC
STINSON, DG
机构
[1] Eastman Kodak Co, Rochester, NY, USA
关键词
D O I
10.1109/20.92242
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
14
引用
收藏
页码:2775 / 2777
页数:3
相关论文
共 14 条
  • [11] COMPOSITION VARIATIONS AS A FUNCTION OF EJECTION ANGLE IN SPUTTERING OF ALLOYS
    OLSON, RR
    WEHNER, GK
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 319 - 321
  • [12] SHIEH HPD, 1985, IEEE T MAGN, V22, P1632
  • [13] SHIMOKAWATO S, 1987, INT S MAGNETOOPTIC S
  • [14] Vossen JL, 1978, THIN FILM PROCESSES, P15