SPATIALLY DELINEATED GROWTH OF METAL-FILMS VIA PHOTOCHEMICAL PRE-NUCLEATION

[1] LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 431 - 431

[2] CHEMICAL VAPOR-DEPOSITION OF SILICON USING A CO2-LASER [J]. APPLIED PHYSICS LETTERS, 1978, 32 (04) : 254 - 256

[3] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES [J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177

[4] *LETUDE DE LA CONDENSATION DES JETS MOLECULAIRES AU MOYEN DE RADIOELEMENTS ARTIFICIELS [J]. JOURNAL DE PHYSIQUE ET LE RADIUM, 1952, 13 (02): : 53 - 58

[5] LASER MICROPHOTOCHEMISTRY FOR USE IN SOLID-STATE ELECTRONICS [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (11) : 1233 - 1243

[6] EHRLICH DJ, UNPUBLISHED

[7] Maissel L.I., 1970, HDB THIN FILM TECHNO

[8] EFFECT OF BEAM TEMPERATURE ON HETEROGENEOUS NUCLEATION OF ZINC FROM VAPOR [J]. JOURNAL OF CHEMICAL PHYSICS, 1966, 44 (05) : 2093 - +

[9] Sigsbee R.A., 1967, ADV COLLOID INTERFAC, V1, P335, DOI 10.1016/0001-8686(67)80007-1

[1] LASER CHEMICAL VAPOR-DEPOSITION OF METALS AND INSULATORS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 431 - 431

[2] CHEMICAL VAPOR-DEPOSITION OF SILICON USING A CO2-LASER [J]. APPLIED PHYSICS LETTERS, 1978, 32 (04) : 254 - 256

[3] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES [J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177

[4] *LETUDE DE LA CONDENSATION DES JETS MOLECULAIRES AU MOYEN DE RADIOELEMENTS ARTIFICIELS [J]. JOURNAL DE PHYSIQUE ET LE RADIUM, 1952, 13 (02): : 53 - 58

[5] LASER MICROPHOTOCHEMISTRY FOR USE IN SOLID-STATE ELECTRONICS [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (11) : 1233 - 1243

[6] EHRLICH DJ, UNPUBLISHED

[7] Maissel L.I., 1970, HDB THIN FILM TECHNO

[8] EFFECT OF BEAM TEMPERATURE ON HETEROGENEOUS NUCLEATION OF ZINC FROM VAPOR [J]. JOURNAL OF CHEMICAL PHYSICS, 1966, 44 (05) : 2093 - +

[9] Sigsbee R.A., 1967, ADV COLLOID INTERFAC, V1, P335, DOI 10.1016/0001-8686(67)80007-1