A XE MARKER STUDY OF THE TRANSFORMATION OF NI2SI TO NISI IN THIN-FILMS

[1] Chu WK., 1978, BACKSCATTERING SPECT

[2] SILICIDE FORMATION IN NI-SI SCHOTTKY-BARRIER DIODES [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1976, 9 (06) : 965 - 972

[3] SILICIDE FORMATION WITH NICKEL AND PLATINUM DOUBLE-LAYERS ON SILICON [J]. THIN SOLID FILMS, 1978, 51 (03) : 411 - 424

[4] FORMATION OF NISI FROM NI2SI STUDIED WITH A PLATINUM MARKER [J]. THIN SOLID FILMS, 1978, 51 (03) : 391 - 394

[5] GHOZLENE HB, 1978, J APPL PHYS, V49, P3998, DOI 10.1063/1.325358

[6] ARGON BUBBLE FORMATION IN SPUTTERING OF PTSI [J]. APPLIED PHYSICS LETTERS, 1978, 32 (11) : 716 - 718

[7] INFLUENCE OF NATURE OF SI SUBSTRATE ON NICKEL SILICIDE FORMED FROM THIN NI FILMS [J]. THIN SOLID FILMS, 1976, 38 (02) : 143 - 150

[8] PICAUX ST, 1974, APPLICATION ION BEAM

[9] RADIOACTIVE SILICON AS A MARKER IN THIN-FILM SILICIDE FORMATION [J]. APPLIED PHYSICS LETTERS, 1977, 30 (10) : 501 - 503

[10] Tu K. N., 1978, Thin films. Interdiffusion and reactions, P359

[1] Chu WK., 1978, BACKSCATTERING SPECT

[2] SILICIDE FORMATION IN NI-SI SCHOTTKY-BARRIER DIODES [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1976, 9 (06) : 965 - 972

[3] SILICIDE FORMATION WITH NICKEL AND PLATINUM DOUBLE-LAYERS ON SILICON [J]. THIN SOLID FILMS, 1978, 51 (03) : 411 - 424

[4] FORMATION OF NISI FROM NI2SI STUDIED WITH A PLATINUM MARKER [J]. THIN SOLID FILMS, 1978, 51 (03) : 391 - 394

[5] GHOZLENE HB, 1978, J APPL PHYS, V49, P3998, DOI 10.1063/1.325358

[6] ARGON BUBBLE FORMATION IN SPUTTERING OF PTSI [J]. APPLIED PHYSICS LETTERS, 1978, 32 (11) : 716 - 718

[7] INFLUENCE OF NATURE OF SI SUBSTRATE ON NICKEL SILICIDE FORMED FROM THIN NI FILMS [J]. THIN SOLID FILMS, 1976, 38 (02) : 143 - 150

[8] PICAUX ST, 1974, APPLICATION ION BEAM

[9] RADIOACTIVE SILICON AS A MARKER IN THIN-FILM SILICIDE FORMATION [J]. APPLIED PHYSICS LETTERS, 1977, 30 (10) : 501 - 503

[10] Tu K. N., 1978, Thin films. Interdiffusion and reactions, P359