SILICIDE FORMATION WITH NICKEL AND PLATINUM DOUBLE-LAYERS ON SILICON

被引：46

作者：

FINSTAD, TG ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91125

来源：

THIN SOLID FILMS | 1978年 / 51卷 / 03期

关键词：

D O I：

10.1016/0040-6090(78)90305-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：411 / 424

页数：14

相关论文

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