SOFT-X-RAY-EMISSION STUDIES OF BULK FE3SI, FESI, AND FESI2, AND IMPLANTED IRON SILICIDES

被引：33

作者：

JIA, JJ

CALLCOTT, TA

OBRIEN, WL

DONG, QY

MUELLER, DR

EDERER, DL

TAN, Z

BUDNICK, JI

机构：

[1] NATL INST STAND & TECHNOL,GAITHERSBURG,MD 20899

[2] UNIV CONNECTICUT,STORRS,CT 06269

来源：

PHYSICAL REVIEW B | 1992年 / 46卷 / 15期

关键词：

D O I：

10.1103/PhysRevB.46.9446

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Bulk iron silicides and implanted iron silicides have been studied by soft-x-ray emission (SXE) spectroscopy. The Si L2,3 emission spectra of these materials are measured. For bulk silicides, these spectra provide a measure of s- and d-type partial density of states (PDOS) localized on the Si sites. We compare them with available band-structure calculations and also with photoemission measurements. For implanted systems, the Si L2,3 emission spectra provide useful information about the silicide formation process with the variation of implant doses.

引用

页码：9446 / 9451

页数：6

共 21 条

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