FIRST DIRECT OBSERVATION OF EL2-LIKE DEFECT LEVELS IN ANNEALED LT-GAAS

被引:18
作者
JAGER, ND
VERMA, AK
DRESZER, P
NEWMAN, N
LILIENTALWEBER, Z
VANSCHILFGAARDE, M
WEBER, ER
机构
[1] LAWRENCE BERKELEY LAB,DIV MAT SCI,BERKELEY,CA 94720
[2] UNIV CALIF BERKELEY,DEPT ELECT ENGN,BERKELEY,CA 94720
[3] STANFORD RES INT,MENLO PK,CA 94025
关键词
DEFECT; EL2; INTERNAL PHOTOEMISSION; LOW-TEMPERATURE GROWN GAAS; PHOTOCURRENT; PHOTOQUENCHING;
D O I
10.1007/BF02650007
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nonstoichiometric arsenic-rich GaAs grown at low temperatures by molecular beam epitaxy (LT-GaAs) has been found to be semi-insulating after high-temperature annealing. The origin of this technologically important conversion is not yet fully understood. In order to study this effect, we performed photocurrent measurements on p-LT GaAs-n diodes in the spectral range between 0.75 and 1.5 eV at 8K. The photocurrent spectra revealed the following features which are unique to the EL2 level: photoquenching, characteristic photoionization transitions to conduction band minima and a presence of a broad band due to the effect of auto-ionization from the excited state. Moreover, modeling of the optical excitation process using realistic band structure demonstrates that these features cannot be explained by ''internal photoemission'' originating from As precipitates, as the ''buried Schottky barrier model'' predicts. This is the first direct experimental evidence for the existence of EL2-like defect levels and their importance for understanding the optical and electronic properties of annealed LT-GaAs.
引用
收藏
页码:1499 / 1502
页数:4
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