COPPER METALLIZATION TECHNOLOGY FOR DEEP-SUBMICRON ULSIS

[1] Arita Y., 1990, International Electron Devices Meeting 1990. Technical Digest (Cat. No.90CH2865-4), P39, DOI 10.1109/IEDM.1990.237231

[2] Arita Y., 1989, International Electron Devices Meeting 1989. Technical Digest (Cat. No.89CH2637-7), P893, DOI 10.1109/IEDM.1989.74198

[3] Arita Y., 1992, Oyo Buturi, V61, P1156

[4] ARITA Y, 1994, INT C ADV MICROELECT, P85

[5] AWAYA N, 1989, VLSI TECH S KYOTO, P35

[6] AWAYA N, 1993, S VLSI TECH KYOTO, P125

[7] CHEMICAL VAPOR-DEPOSITED COPPER FROM ALKYNE STABILIZED COPPER(I) HEXAFLUOROACETYLACETONATE COMPLEXES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (01) : 154 - 159

[8] SELECTIVITY AND COPPER CHEMICAL VAPOR-DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (11) : 3295 - 3299

[9] Farkas J., 1992, Advanced Metallization for ULSI Applications (Formerly Workshop on Tungsten and Other Advanced Metals for ULSI Applications) Proceedings of the Conference, P445

[10] GELATOS AV, 1993, S VLSI TECH KYOTO, P123

[1] Arita Y., 1990, International Electron Devices Meeting 1990. Technical Digest (Cat. No.90CH2865-4), P39, DOI 10.1109/IEDM.1990.237231

[2] Arita Y., 1989, International Electron Devices Meeting 1989. Technical Digest (Cat. No.89CH2637-7), P893, DOI 10.1109/IEDM.1989.74198

[3] Arita Y., 1992, Oyo Buturi, V61, P1156

[4] ARITA Y, 1994, INT C ADV MICROELECT, P85

[5] AWAYA N, 1989, VLSI TECH S KYOTO, P35

[6] AWAYA N, 1993, S VLSI TECH KYOTO, P125

[7] CHEMICAL VAPOR-DEPOSITED COPPER FROM ALKYNE STABILIZED COPPER(I) HEXAFLUOROACETYLACETONATE COMPLEXES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (01) : 154 - 159

[8] SELECTIVITY AND COPPER CHEMICAL VAPOR-DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (11) : 3295 - 3299

[9] Farkas J., 1992, Advanced Metallization for ULSI Applications (Formerly Workshop on Tungsten and Other Advanced Metals for ULSI Applications) Proceedings of the Conference, P445

[10] GELATOS AV, 1993, S VLSI TECH KYOTO, P123