X-RAY TOPOGRAPHS OF SILICON-CRYSTALS WITH SUPERPOSED OXIDE FILM - A THEORETICAL-STUDY BY MEANS OF SIMULATIONS

被引：7

作者：

EPELBOIN, Y

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] UNIV PARIS 07,F-75252 PARIS 05,FRANCE

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 01期

关键词：

D O I：

10.1063/1.341452

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：109 / 113

页数：5

共 21 条

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