X-RAY-DIFFRACTION TOPOGRAPHS OF SILICON CRYSTALS WITH SUPERPOSED OXIDE FILM .3. INTENSITY DISTRIBUTION

被引：41

作者：

ANDO, Y

PATEL, JR

KATO, N

机构：

[1] NAGOYA UNIV,DEPT APPL PHYS,NAGOYA,JAPAN

[2] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 10期

关键词：

D O I：

10.1063/1.1661973

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4405 / 4412

页数：8

共 10 条

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ANDO, Y ;

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[2] ENHANCED X-RAY DIFFRACTION FROM SUBSTRATE CRYSTALS CONTAINING DISCONTINUOUS SURFACE FILMS [J].

BLECH, IA ;

MEIERAN, ES .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (07) :2913-&

[3] PENDELLOSUNG FRINGES IN DISTORTED CRYSTALS .3. APPLICATION TO HOMOGENEOUSLY BENT CRYSTALS [J].

KATO, N .

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1964, 19 (06) :971-&

[4] X-RAY-DIFFRACTION TOPOGRAPHS OF SILICON CRYSTALS WITH SUPERPOSED OXIDE FILM .1. THEORY AND COMPUTATIONAL PROCEDURES [J].

KATO, N ;

PATEL, JR .

JOURNAL OF APPLIED PHYSICS, 1973, 44 (03) :965-970

[5] RECIPROCITY THEOREM IN OPTICS AND ITS APPLICATION TO X-RAY DIFFRACTION TOPOGRAPHS [J].

KATO, N .

ACTA CRYSTALLOGRAPHICA SECTION A-CRYSTAL PHYSICS DIFFRACTION THEORETICAL AND GENERAL CRYSTALLOGRAPHY, 1968, A 24 :157-&

[6] X-RAY-DIFFRACTION TOPOGRAPHS OF SILICON CRYSTALS WITH SUPERPOSED OXIDE FILM .2. PENDELLOSUNG FRINGES - COMPARISON OF EXPERIMENT WITH THEORY [J].

PATEL, JR ;

KATO, N .

JOURNAL OF APPLIED PHYSICS, 1973, 44 (03) :971-977

[7] X-RAY DYNAMICAL DIFFRACTION EFFECTS OF OXIDE FILMS ON SILICON SUBSTRATES [J].

PATEL, JR ;

KATO, N .

APPLIED PHYSICS LETTERS, 1968, 13 (01) :40-&

[8]

Penning P., 1961, PHILIPS RES REP, V16, P419

[9] X-RAY STRESS TOPOGRAPHY OF THIN FILMS ON GERMANIUM AND SILICON [J].

SCHWUTTK.GH ;

HOWARD, JK .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (03) :1581-&

[10]

Timoshenko, 1951, THEORY ELASTICITY

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