THIN-FILM METALLIZATION OF OXIDES IN MICROELECTRONICS

被引：94

作者：

MATTOX, DM ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

关键词：

D O I：

10.1016/0040-6090(73)90096-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：173 / 186

页数：14

共 114 条

[1] ADHESION BETWEEN PRECIOUS METALS [J].

ANGUS, HC .

[2]

BATESON S, 1952, VACUUM, V2, P635

[3] TEMPERATURE CHANGES IN THIN METAL FILMS DURING VAPOR DEPOSITION [J].

BELOUS, MV ;

WAYMAN, CM .

[4] ADHESION OF EVAPORATED METAL FILMS ON GLASS [J].

BENJAMIN, P ;

WEAVER, C .

[5]

BERNSTEIN L, 1966, T METALL SOC AIME, V236, P405

[6]

Berry R.W., 1968, THIN FILM TECHNOLOGY

[7]

BERRY RW, 1968, THIN FILM TECHNOLOGY, pCH12

[8] EVAPORATED FILM PROFILES OVER STEPS IN SUBSTRATES [J].

BLECH, IA .

[9]

BOETCHER A, 1950, OPTIK, V6, P229

[10] ULTRAVIOLET DEPOLYMERIZATION OF PHOTORESIST POLYMERS [J].

BOLON, DA ;

KUNZ, CO .