REDUCTION OF CHARGING IN SURFACE-ANALYSIS OF INSULATING MATERIALS BY AES

被引：33

作者：

ICHIMURA, S

BAUER, HE

SEILER, H

HOFMANN, S

机构：

[1] UNIV HOHENHEIM,INST PHYS,D-7000 STUTTGART 70,FED REP GER

[2] MAX PLANCK INST MET RES,INST WERKSTOFFWISSENSCH,D-7000 STUTTGART 80,FED REP GER

来源：

SURFACE AND INTERFACE ANALYSIS | 1989年 / 14卷 / 05期

关键词：

D O I：

10.1002/sia.740140507

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：250 / 256

页数：7

共 12 条

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[6]

ISAACSON M, 1978, 9TH P INT C EL MICR, V3, P61

[7]

LEGRESSUS C, 1984, SCANNING ELECTRON MI, V1, P41

[8]

Seiler H, 1984, SCANNING ELECTRON MI, V3, P1081

[9] CHARGING DYNAMICS OF DIELECTRICS IRRADIATED BY LOW-ENERGY ELECTRONS [J].

VONSEGGERN, H .

IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1985, 32 (04) :1503-1511

[10]

WEI W, 1988, J VAC SCI TECHNOL A, V6, P256

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