WETTING BEHAVIOR OF LIQUID ON GEOMETRICAL ROUGH-SURFACE FORMED BY PHOTOLITHOGRAPHY

被引：30

作者：

KAWAI, A

NAGATA, H

机构：

[1] ULSI Laboratory, Mitsubishi Electric Corporation, Itami, Hyogo, 664

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1994年 / 33卷 / 9A期

关键词：

WETTING; ADHESION; PHOTORESIST; LSI; LITHOGRAPHY; SURFACE FREE ENERGY; CONTACT ANGLE; THERMODYNAMICS;

D O I：

10.1143/JJAP.33.L1283

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of roughness on the wettability is studied. The rough surface is constructed with photoresist micropatterns which are formed by photolithography. The aspect ratio is defined as the length ratio between the pattern space and its height. Contact angles of three kinds of liquids, pure water, diiodomethane and ethylene glycol, increase and saturate with the increase of the aspect ratio. The wetting behavior of pure water of which higher surface energy is extremely complex.

引用

收藏

页码：L1283 / L1285

页数：3

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