PLASMA DEPOSITION OF AMORPHOUS-SILICON FILMS - AN OVERVIEW ON SOME OPEN QUESTIONS

被引：14

作者：

CAPEZZUTO, P

BRUNO, G

机构：

来源：

PURE AND APPLIED CHEMISTRY | 1988年 / 60卷 / 05期

关键词：

D O I：

10.1351/pac198860050633

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：633 / 644

页数：12

共 51 条

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[2] MECHANISM OF SILICON FILM DEPOSITION IN THE RF PLASMA REDUCTION OF SILICON TETRACHLORIDE [J].

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