THE INFLUENCE OF ARGON ADDITION ON THE DEPOSITION AND PROPERTIES OF SI H, CL FILMS PREPARED IN A GLOW-DISCHARGE

被引：8

作者：

BRUNO, G

CAPEZZUTO, P

CICALA, G

CRAMAROSSA, F

机构：

来源：

THIN SOLID FILMS | 1986年 / 135卷 / 02期

关键词：

D O I：

10.1016/0040-6090(86)90131-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：245 / 250

页数：6

共 11 条

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[4]

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[8] GROWTH-MORPHOLOGY AND DEFECTS IN PLASMA-DEPOSITED A-SI-H FILMS [J].

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[9] ELECTRICAL AND OPTICAL-PROPERTIES OF AMORPHOUS SI-F-H ALLOYS [J].

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[10]

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