DEPOSITION RATE AND STRUCTURAL-PROPERTIES OF MICROCRYSTALLINE GLOW-DISCHARGE SI-H,CL FILMS

[1] PHYSICAL CHARACTERIZATION OF HALOGENATED AND HYDROGENATED AMORPHOUS-SILICON FILMS [J]. THIN SOLID FILMS, 1980, 69 (03) : 315 - 320

[2] OPTICAL-CONSTANTS OF SILICON FILMS DEPOSITED BY THE R.F. GLOW-DISCHARGE OF SICL4 [J]. THIN SOLID FILMS, 1981, 86 (04) : 359 - 367

[3] BRODSKY MH, 1979, AMORPHOUS SEMICONDUC

[4] RF PLASMA DEPOSITION OF AMORPHOUS-SILICON FILMS FROM SICL4-H2 [J]. THIN SOLID FILMS, 1980, 67 (01) : 103 - 107

[5] BRUNO G, 1981, 5TH P INT S PLASM CH, P652

[6] Carlson D. E., 1980, POLYCRYSTALLINE AMOR

[7] dAgostino R., 1982, PLASMA CHEM PLASMA P, V2, P213

[8] FLAMM DL, 1981, J APPL PHYS, V52, P3833

[9] Flamm DL, 1981, PLASMA CHEM PLASMA P, V1, P37, DOI DOI 10.1007/BF00566374

[10] CHARACTERIZATION AND LUMINESCENCE OF A-SI-H-CL FILMS [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1981, 46 (01) : 95 - 104

[1] PHYSICAL CHARACTERIZATION OF HALOGENATED AND HYDROGENATED AMORPHOUS-SILICON FILMS [J]. THIN SOLID FILMS, 1980, 69 (03) : 315 - 320

[2] OPTICAL-CONSTANTS OF SILICON FILMS DEPOSITED BY THE R.F. GLOW-DISCHARGE OF SICL4 [J]. THIN SOLID FILMS, 1981, 86 (04) : 359 - 367

[3] BRODSKY MH, 1979, AMORPHOUS SEMICONDUC

[4] RF PLASMA DEPOSITION OF AMORPHOUS-SILICON FILMS FROM SICL4-H2 [J]. THIN SOLID FILMS, 1980, 67 (01) : 103 - 107

[5] BRUNO G, 1981, 5TH P INT S PLASM CH, P652

[6] Carlson D. E., 1980, POLYCRYSTALLINE AMOR

[7] dAgostino R., 1982, PLASMA CHEM PLASMA P, V2, P213

[8] FLAMM DL, 1981, J APPL PHYS, V52, P3833

[9] Flamm DL, 1981, PLASMA CHEM PLASMA P, V1, P37, DOI DOI 10.1007/BF00566374

[10] CHARACTERIZATION AND LUMINESCENCE OF A-SI-H-CL FILMS [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1981, 46 (01) : 95 - 104