DEPOSITION RATE AND STRUCTURAL-PROPERTIES OF MICROCRYSTALLINE GLOW-DISCHARGE SI-H,CL FILMS

[21] SMITH D, 1982, COMMUNICATION

[22] PROPERTIES OF A-SI-H-F DEPOSITED IN SIF4-SIH4-AR GAS-MIXTURES BY A GLOW-DISCHARGE TECHNIQUE [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 41 (02) : 151 - 159

[23] VANDEVEN EPG, 1981, PLASMA PROCESSING, P112

[24] A THERMODYNAMIC CRITERION OF THE CRYSTALLINE-TO-AMORPHOUS TRANSITION IN SILICON [J]. PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1982, 45 (01): : 137 - 145

[25] VEPREK S, 1981, J PHYS-PARIS, V42, P251

[26] Veprek S., 1982, PLASMA CHEM PLASMA P, V2, P233

[27] Wagner J. J., 1982, PLASMA CHEM PLASMA P, V2, P95, DOI DOI 10.1007/BF00566860

[21] SMITH D, 1982, COMMUNICATION

[22] PROPERTIES OF A-SI-H-F DEPOSITED IN SIF4-SIH4-AR GAS-MIXTURES BY A GLOW-DISCHARGE TECHNIQUE [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 41 (02) : 151 - 159

[23] VANDEVEN EPG, 1981, PLASMA PROCESSING, P112

[24] A THERMODYNAMIC CRITERION OF THE CRYSTALLINE-TO-AMORPHOUS TRANSITION IN SILICON [J]. PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1982, 45 (01): : 137 - 145

[25] VEPREK S, 1981, J PHYS-PARIS, V42, P251

[26] Veprek S., 1982, PLASMA CHEM PLASMA P, V2, P233

[27] Wagner J. J., 1982, PLASMA CHEM PLASMA P, V2, P95, DOI DOI 10.1007/BF00566860