THERMAL-DECOMPOSITION OF A SILICON-FLUORIDE ADLAYER - EVIDENCE FOR SPATIALLY INHOMOGENEOUS REMOVAL OF A SINGLE MONOLAYER OF THE SILICON SUBSTRATE

被引：30

作者：

ENGSTROM, JR

NELSON, MM

ENGEL, T

机构：

来源：

PHYSICAL REVIEW B | 1988年 / 37卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.37.6563

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：6563 / 6566

页数：4

共 16 条

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