SOFT-X-RAY PHOTOEMISSION-STUDY OF THE SILICON FLUORINE ETCHING REACTION

[1] ELECTRON-SPECTROSCOPY STUDY OF SILICON SURFACES EXPOSED TO XEF2 AND THE CHEMISORPTION OF SIF4 ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) : 2614 - 2619

[2] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]

[3] NON-THERMAL EFFECTS IN LASER-ENHANCED ETCHING OF SILICON BY XEF2 [J]. CHEMICAL PHYSICS LETTERS, 1983, 95 (01) : 5 - 8

[4] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .2. KINETICS OF THE INITIAL RESPONSE TO LIGHT [J]. JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (10) : 4851 - 4858

[5] SYNCHROTRON PHOTOEMISSION INVESTIGATION OF THE INITIAL-STAGES OF FLUORINE ATTACK ON SI SURFACES - RELATIVE ABUNDANCE OF FLUOROSILYL SPECIES [J]. PHYSICAL REVIEW B, 1984, 30 (02): : 764 - 770

[6] SYNCHROTRON PHOTOEMISSION INVESTIGATION - FLUORINE ON SILICON SURFACES [J]. APPLIED PHYSICS LETTERS, 1984, 45 (02) : 174 - 176

[7] ABINITIO CLUSTER STUDY OF THE INTERACTION OF FLUORINE AND CHLORINE WITH THE SI(111) SURFACE [J]. PHYSICAL REVIEW B, 1983, 28 (04): : 2023 - 2038

[8] SHINN ND, 1984, J VACUUM SCI TECHNOL, V42, P1593

[9] REACTION OF ATOMIC FLUORINE WITH SILICON - THE GAS-PHASE PRODUCTS [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (05) : 3799 - 3805

[10] ETCHING OF SILICON WITH XEF2 VAPOR [J]. APPLIED PHYSICS LETTERS, 1979, 34 (01) : 70 - 73

[1] ELECTRON-SPECTROSCOPY STUDY OF SILICON SURFACES EXPOSED TO XEF2 AND THE CHEMISORPTION OF SIF4 ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) : 2614 - 2619

[2] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]

[3] NON-THERMAL EFFECTS IN LASER-ENHANCED ETCHING OF SILICON BY XEF2 [J]. CHEMICAL PHYSICS LETTERS, 1983, 95 (01) : 5 - 8

[4] PHOTOEFFECTS ON THE FLUORINATION OF SILICON .2. KINETICS OF THE INITIAL RESPONSE TO LIGHT [J]. JOURNAL OF CHEMICAL PHYSICS, 1984, 80 (10) : 4851 - 4858

[5] SYNCHROTRON PHOTOEMISSION INVESTIGATION OF THE INITIAL-STAGES OF FLUORINE ATTACK ON SI SURFACES - RELATIVE ABUNDANCE OF FLUOROSILYL SPECIES [J]. PHYSICAL REVIEW B, 1984, 30 (02): : 764 - 770

[6] SYNCHROTRON PHOTOEMISSION INVESTIGATION - FLUORINE ON SILICON SURFACES [J]. APPLIED PHYSICS LETTERS, 1984, 45 (02) : 174 - 176

[7] ABINITIO CLUSTER STUDY OF THE INTERACTION OF FLUORINE AND CHLORINE WITH THE SI(111) SURFACE [J]. PHYSICAL REVIEW B, 1983, 28 (04): : 2023 - 2038

[8] SHINN ND, 1984, J VACUUM SCI TECHNOL, V42, P1593

[9] REACTION OF ATOMIC FLUORINE WITH SILICON - THE GAS-PHASE PRODUCTS [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (05) : 3799 - 3805

[10] ETCHING OF SILICON WITH XEF2 VAPOR [J]. APPLIED PHYSICS LETTERS, 1979, 34 (01) : 70 - 73