ELECTRON BEAM EXPOSURE OF SILICONES

被引：22

作者：

YATSUI, Y

NAKATA, T

UMEHARA, K

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1969年 / 116卷 / 01期

关键词：

D O I：

10.1149/1.2411783

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：94 / &

共 17 条

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[6] FORMATION OF THIN POLYMER FILMS BY ELECTRON BOMBARDMENT [J].

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[7]

Hill G.W., 1965, MICROELECTRON RELIAB, V4, P109

[8]

HLAVIN JM, 1965, 1 INT C EL ION BEAM, P231

[9]

HOLLAND H, 1964, VACUUM, V14, P325

[10]

KANAYA K, 1966, 6 P INT C EL MICR KY

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