ACCELERATED METASTABLE DEFECT CREATION IN A-SI-H BY SHORT LIGHT-PULSES

被引：18

作者：

STUTZMANN, M

NUNNENKAMP, J

BRANDT, MS

ASANO, A

ROSSI, MC

机构：

[1] FUJI ELECT CORP RES & DEV LTD,YOKOSUKA 24001,JAPAN

[2] UNIV ROME,DIPARTIMENTO ELETTR,I-00184 ROME,ITALY

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1991年 / 137卷

关键词：

D O I：

10.1016/S0022-3093(05)80098-5

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The creation of metastable defects in hydrogenated amorphous silicon subjected to short, intense light pulses has been studied. Experimental results for a variety of pulsed light sources are presented and discussed. It is found that pulse degradation leads to much faster creation of metastable defects, with interesting consequences for accelerated degradation testing and for the modelling of the Staebler-Wronski-effect in a-Si:H.

引用

页码：231 / 234

页数：4

共 4 条

[1] THE CONNECTION BETWEEN DISPERSIVE HYDROGEN MOTION AND THE KINETICS OF LIGHT-INDUCED DEFECTS IN HYDROGENATED AMORPHOUS-SILICON [J].