TEMPERATURE COEFFICIENT OF RESISTANCE OF BETATANTALUM FILMS AND MIXTURES WITH BCC-TANTALUM

被引：39

作者：

SCHWARTZ, N ^{[1
]}

REED, WA ^{[1
]}

POLASH, P ^{[1
]}

READ, MH ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

THIN SOLID FILMS | 1972年 / 14卷 / 02期

关键词：

D O I：

10.1016/0040-6090(72)90433-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：333 / 347

页数：15

共 15 条

[1]

BERRY RW, 1968, THIN FILM TECHNOLOGY, P236

[2]

BERRY RW, 1968, THIN FILM TECHNOLOGY, P221

[3] EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS [J].

GERSTENBERG, D ;

CALBICK, CJ .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :402-&

[4]

MEADEN GT, 1965, ELECTRICAL RESISTANC, P34

[5]

MEADEN GT, 1965, ELECTRICAL RESISTANC, P53

[6] IONIC CONDUCTIVITY DIELECTRIC CONSTANT AND OPTICAL PROPERTIES OF ANODIC OXIDE FILMS ON 2 TYPES OF SPUTTERED TANTALUM FILMS [J].

MILLS, D ;

YOUNG, L ;

ZOBEL, FGR .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (04) :1821-&

[7]

Mills D. J, 1966, J CAN CERAM SOC, V35, P48

[8] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J].

READ, MH ;

ALTMAN, C .

APPLIED PHYSICS LETTERS, 1965, 7 (03) :51-&

[9] X-RAY ANALYSIS OF SPUTTERED FILMS OF BETA-TANTALUM AND BODY-CENTERED CUBIC TANTALUM [J].

READ, MH ;

HENSLER, DH .

THIN SOLID FILMS, 1972, 10 (01) :123-&

[10]

READ MH, 1964, 27 P ANN PITTSB DIFF

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