A SHORT REVIEW OF IONIZED CLUSTER BEAM TECHNOLOGY

被引:26
作者
YAMADA, I
机构
[1] Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto
关键词
D O I
10.1016/0168-583X(94)00562-1
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Surface processing technology by ionized cluster beams (ICB) having energies of a few keV is reviewed in comparison with the one of atomic and molecular ion beams. It has been demonstrated that the ICB technique can be applied to a wide variety of surface processes for industrial applications. Since ion-surface interactions of cluster ions are quite different than those of monomer ions, new opportunities for surface processing exist, such as deposition, surface cleaning, low damage sputtering and shallow implantation.
引用
收藏
页码:240 / 243
页数:4
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